Antireflection of transparent polymers by advanced plasma etching procedures
نویسندگان
چکیده
منابع مشابه
Selective Plasma Etching of Polymeric Substrates for Advanced Applications
In today's nanoworld, there is a strong need to manipulate and process materials on an atom-by-atom scale with new tools such as reactive plasma, which in some states enables high selectivity of interaction between plasma species and materials. These interactions first involve preferential interactions with precise bonds in materials and later cause etching. This typically occurs based on mater...
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ژورنال
عنوان ژورنال: Optics Express
سال: 2007
ISSN: 1094-4087
DOI: 10.1364/oe.15.013108